SMEE shows model of dry lithography platform; company reports over 10 million wafers processed

Shanghai Micro Electronics Equipment (SMEE), a Chinese semiconductor equipment maker, displayed a model of its "next-generation front-end dry lithography equipment universal technology platform" at the 9th China International Import Expo, JKN News reports. The expo was held at the National Exhibition and Convention Center in Shanghai from the 5th to the 10th. jkn.co.krJKN Newsnews.jkn.co.krOpen source ↗ SMEE says its equipment already operates on mass production lines for logic and memory chips in China.

Front-end lithography forms circuit patterns on semiconductor wafers and is among the manufacturing steps with the highest technical barriers. SMEE presents the platform as a step in localizing such equipment in China and says it can independently control key elements, including high-precision objective lenses and illumination systems.

Performance figures reported by SMEE

The company claims that the imaging performance of its dry front-end lithography equipment is approaching that of leading international products. It says that overlay precision, which governs the alignment of successive circuit layers, and production efficiency are quickly catching up with international standards. SMEE also cites process stability and reliability in production-line operation.

According to SMEE, several units are in long-term operation at major Chinese logic and memory mass production lines. The company reports that the cumulative number of processed wafers exceeds 10 million and that equipment availability exceeds 92%. These figures and assessments were provided by SMEE itself. jkn.co.krJKN Newsnews.jkn.co.krOpen source ↗

SMEE describes itself as the only company in China capable of stable mass production of front-end dry lithography equipment. It says it carries out design, research and development, production, manufacturing, sales and technical service of core lithography equipment.

Context of the exhibition

The 9th China International Import Expo brought together 162 countries, regions and international organizations and 4,142 overseas companies. Its exhibition area exceeded 440,000 square meters for the first time, and semiconductor equipment was included in the official exhibition area.

The U.S. and allies including the Netherlands restrict exports of extreme ultraviolet (EUV) lithography equipment and some advanced deep ultraviolet (DUV) equipment to China. Last month, the Chinese company Langdao Suiyan unveiled a prototype light source system, a key component of EUV lithography equipment. jkn.co.krJKN Newsnews.jkn.co.krOpen source ↗