SMEE shows model of next-generation dry lithography platform at China International Import Expo
Shanghai Micro Electronics Equipment says its front-end dry lithography tools have processed over 10 million wafers; what was shown at the expo is a model.
Chinese company Shanghai Micro Electronics Equipment (SMEE) displayed a model of its in-house "next-generation front-end dry lithography general technology platform" at the 9th China International Import Expo, held November 5–10. The company announced this on social media on November 9, yna.co.kr reports yna.co.kr
yna.co.kryna.co.krOpen source ↗. The exhibit is a model, not a production tool.
SMEE says it can independently control the key supply chain, including high-precision objective lenses and illumination systems. According to the company, the shape performance of its front-end dry lithography tools is comparable to leading international products, while overlay accuracy and production efficiency are close to international standards.
The company reports that several of its tools have run stably in major Chinese logic and memory chip production, processing more than 10 million wafers in total, with effective utilization above 92%. SMEE also states that it is the only Chinese company able to stably mass-produce front-end dry lithography tools.
Last month, another Chinese company, Langdao Suiyan, showed a prototype of a light source system, a key component of EUV lithography tools, at an exhibition.
